Description:
This technology features an improved method for fabricating nanofluidic channels on a silicon substrate. This method is used to develop nanofluidic channels having a height of about 1nm to 10nm. Additionally, a method for dielectric spectroscopy measurements using the above nanofluidic channels has been developed.
Applications:
• Sensing, characterization and analysis tools for a variety of fundamental scientific and engineering investigations, particularly in the biomedical field
• Planar nanofluidic channels
• DNA sequencing
Benefits:
• Novel, yet simple, technique to fabricate 1-10 nm planar channels
Inventors: Pingshan Wang
Protection Status: Patent application filed
Licensing Status: Available for licensing
Additional Terms: Dielectric, Spectrometers, Sensor, Analysis, Nanofluidic, Nanotechnology
CURF Ref No: 09-033
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